CONTROLLED SYNTHESIS OF THIN FILMS OBTAINED BY MAGNETRON SPUTTERING TECHNIQUE

Utkin Kirill Eduardovich, deputy chief of the microelectronics department, Scietific-research Institute of Physical Measurement (8/10 Volodarskogo street, Penza, Russia), niifi@sura.ru
Torgashin Sergey Ivanovich, candidate of technical sciences, depute general director for production and technologies, Scietific-research Institute of Physical Measurement (8/10 Volodarskogo street, Penza, Russia), niifi@sura.ru
Khoshev Aleksandr Vyacheslavovich, candidate of technical sciences, engineer, Scietific-research Institute of Physical Measurement
(8/10 Volodarskogo street, Penza, Russia), niifi@sura.ru

621.793.7

10.21685/2307-5538-2018-2-6

Background. Recently the magnetron sputtering technique providing controlled thin-layers sputtering with the required parameters has been rapidly developing. When a target is used multiple times a zone of erosion (groove) is formed on it having a direct impact on material sputtering rate (film thickness). Reduction of thin film thickness causes the electrical resistivity increase, i.e. non-repeatability of the required response and parameters. The work objective is sputtering of thin films with the required parameters and response by means of long-term or multiple use target.
Materials and methods. Relation between film thickness and resistance and target erosion depth has been defined. Dependence of film thickness on sputtering time on the basis of target erosion depth has been defined as well.
Results. It is possible to perform controlled synthesis of thin films with the given physical parameters by magnetron sputtering technique, to improve the required parameters repeatability under long-term and multiple use of a target.
Conclusions. The controlled synthesis of thin films obtained by magnetron sputtering technique will provide the given parameters and characteristics by means of long-term or multiple use target.

metal-film pressure sensors, thin film synthesis, grooving while thin-film sputtering, magnetron sputtering technique, groove (erosion), target, film thickness, time of thin-film sputtering